Perturbation Theory for Thin Cladding Layers on Silicon Photonic Systems

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dc.contributor.advisor Weiss, Sharon M., 1977-
dc.contributor.author Phare, Christopher
dc.date.accessioned 2011-07-29T17:55:43Z
dc.date.available 2011-07-29T17:55:43Z
dc.date.issued 2011-04
dc.identifier.uri http://hdl.handle.net/1803/4841
dc.description.abstract I develop a perturbation theory for resonant frequency shifts caused by thin layer of material added to dielectric systems.  This development can be used to effectively model photonic surface-sensing systems, which use this resonance shift to measure the presence of, e.g., biomolecules attached to the sensor system.  Direct modeling was previously intractable due to extremely long simulation times required to account for the cladding layers.  The developed theory is verified against a special-case direct simulation and by measuring the shift caused by silicon dioxide deposited on a fabricated ring-resonator sensor. en_US
dc.language.iso en_US en_US
dc.publisher Vanderbilt University. Dept. of Physics and Astronomy en_US
dc.subject photonics en_US
dc.subject ring resonator en_US
dc.subject perturbation theory en_US
dc.subject photonic crystal en_US
dc.subject sensing en_US
dc.subject.lcsh Perturbation (Mathematics) en_US
dc.subject.lcsh Photonics en_US
dc.subject.lcsh Dielectric films en_US
dc.subject.lcsh Thin films en_US
dc.subject.lcsh Dielectric resonators en_US
dc.title Perturbation Theory for Thin Cladding Layers on Silicon Photonic Systems en_US
dc.type Thesis en_US
dc.description.college College of Arts and Science en_US
dc.description.school Vanderbilt University en_US
dc.description.department Department of Physics and Astronomy en_US

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